ELENA is a Horizon 2020 Marie Sklodowska-Curie Innovative Training Network. It pulls together diverse resources from commercial partners, research institutes and universities to study the fundamental processes underpinning two innovative, next generation nanoscopic fabrication techniques: Extreme Ultra Violet Lithography (EUVL) and Focused Electron Beam Induced Processing (FEBIP). The network seeks to train through research a new generation of Early Stage Researchers with a fundamental understanding of the physics and chemistry underpinning FEBIP and EUVL and in commercial and entrepreneurial skills necessary to bring such research from the laboratory to the commercial arena. The overall aim is to translate the knowledge gained in this collaborative project to technological advantage with the ultimate goal of making these methods commercially competitive within the nanotechnology industry.
More information about ELENA can be found here: https://elena.hi.is/
Based on the successful 1st conference at the Sieldce University in 2018, this conference aims to bring together leading experts from both academia and industry to share their vision and results about: fundamental aspects of material chemistry, light-matter interaction, low electron energy induced processes, metrology, fields of applications, technology needs and material and process challenges for EUVL and FEBIP. The two-days and half program will include invited and contributed speakers, a poster session and a reception on the evening of September 5th.