Location: TBD, San Jose, CA, USA
Date: Sunday, February 26th, 2017, pm
Chair : Emily Gallagher (imec)
The EUV pellicle is considered one of the key enabling features for the introduction of EUV lithography into manufacturing. The EUV pellicle and its associated infrastructure will be explored at a meeting just before SPIE’s Advanced Lithography. Attendance is typically capped at ~100 to enable interaction with speakers. Updates on the membrane, use case, and related equipment will be presented by experts in short, focused talks. Registration details will follow soon.