/International Conference on Extreme Ultraviolet Lithography 2024

International Conference on Extreme Ultraviolet Lithography 2024

29 September - 03 October 2024 | Monterey, California, US

SPIE Photomask Technology + EUV Lithography 2024

imec

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Event Details

SPIE Photomask Technology + EUV Lithography 2024 is a global forum with two concurrent and tightly integrated conferences held in Monterey, California. It is an excellent opportunity for scientists, engineers, and industry leaders to meet, present and discuss results, challenges, and potential solutions in optical and EUV masks and lithography. Registration and travel support is available to encourage student participation in the conferences. Additionally, the symposium provides two industry-sponsored student presentation awards.

The International Conference on Extreme Ultraviolet Lithography provides a forum to discuss and assess the worldwide status of EUV Lithography technology and associated infrastructure readiness. Scientists, engineers, and industry leaders meet to present and discuss new and unpublished materials, addressing the main challenges associated with the extendibility of the technology to smaller dimensions.

The 2023 conference highlighted the continued increasing maturity of EUV lithography as well as further increased adoption for in high volume manufacturing. Despite the steady progress both at 0.33 NA as well as 0.55-NA optic and scanner development, the consensus of the EUVL Steering Committee was that there were no significant breakthroughs reported in the areas of critical infrastructure required to support 0.55 NA. In particular, the topics of high-NA resists and next generation masks were called out as topics of significant concern. Specific continuing concerns were stochastics in resist materials/processes (which can lead to roughness and failures thereby affecting yield), mask defectivity (including alternative pellicle developments), and the extension of EUV mask infrastructure and technology (including alternative mask absorber developments including phase shift masks).

 

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