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/Expertise/Large-Area Electronics/高解析度光刻:实现全彩OLED像素的新途径


2020 7月20號 周一 

下午4點 北京時間 / 早上10點 中歐時間 



Key takeaways


  • 光刻工艺与FMM及CF+白光OLED的差异
  • 提供全新OLED像素设计的自由度
  • 实现OLED和OPD的并排结构

About Dr. Tung-Huei Ke 

Dr. Tung-Huei Ke obtained BSc and Ph.D. degrees at National Taiwan University in 2003 and 2009, respectively. He was a visiting scholar at TU Dresden in Prof. Karl Leo’s group and at Kyushu University in Prof. Chihaya Adachi’s group for high-performance OLED and OLET studies in 2007 and 2008, respectively. Dr. Ke joined imec, Belgium in 2011 as technical lead in a cross-nation European Union project (COSMIC) for organic CMOS technology development for ultra-low power logic applications. Since then, he is the imec representative in H2020 EU projects (EXTMOS, Hi-response) and is responsible for the technology transfer to the imec industrial partners. Since 2013, Dr. Ke has been working on the development of integration techniques to employ organic semiconductors for hybrid electronics applications. He currently focuses on the photolithography processes to realize high-resolution OLED/PD arrays side-by-side and the corresponding degradation mechanisms of the organic devices caused by the extrinsic processes. He contributed to over 20 invited talks at international conferences and over 60 publications at international journals.