Leuven | More than two weeks ago
The goal of this project research is to explore and invent/utilize different data analysis methods and advanced machine learning architectures/strategies to control advanced process steps during semiconductor manufacturing , more specifically in Lithography
Type of project: Combination of internship and thesis, Internship, Thesis
Duration: 6 months. Can be extended based on performance.
Required degree: Master of Engineering Technology, Master of Science, Master of Engineering Science
Required background: Computer Science, Electrotechnics/Electrical Engineering, Chemistry/Chemical Engineering, Physics
Imec allowance will be provided.