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/Job opportunities/Electrochemical Atomic Layer Deposition (e-ALD) of Pt on nanostructured electrodes for water splitting

Electrochemical Atomic Layer Deposition (e-ALD) of Pt on nanostructured electrodes for water splitting

Master projects/internships - Leuven | More than two weeks ago

Mechanistic study of Pt e-ALD on high surface area nanostructured electrodes for water electrolysis.

Thin film technology is a fully-fledged domain which has enabled countless applications in the nanoelectronics, photovoltaic and biomedical industries. The combination of large active surface areas offered by 3D nanostructured substrates and controlled growth of thin films ranging from a few monolayers to tens of nanometers is recently attracting immense interest especially for catalytic purposes. With growing demands for energy and the concern of global warming, climate-neutral fuels such as H2 derived from water splitting is currently being considered as a promising solution. In this regard, nanostructured electrodes coated with efficient electro catalysts such as Pt, Ru, RuO2, Ir etc. shows great potential for hydrogen and oxygen evolution reactions. Atomic/Molecular Layer Deposition (ALD/MLD) which is characterized by self-terminating surface reactions is the preferred technique to coat conformal thin films (monolayer by monolayer) on nanostructured substrates. However, this process is limited by its expensive design, dependence on gaseous precursors and the need for ultra-high vacuum conditions.

In this master thesis, you will be a part of an exploration into the electrochemical counterpart of ALD known as e-ALD. The mechanism Pt e-ALD on large surface area Ni nanomesh electrodes will be systematically studied with focus on the effect of anionic species present in the electrolyte. Further, the feasibility of such surface limited redox reactions for the deposition of other metals such as Ru may also be interesting.


Type of project: Thesis


Required degree: Master of Science

Required background: Nanoscience & Nanotechnology

Supervising scientist(s): For further information or for application, please contact: Philippe Vereecken ( and Siggi Wodarz ( and Venkataramana Rishikesan (