Research & development - Leuven | More than two weeks ago
Explore the radiolysis of EUV exposure of photoresists using femtosecond time-resolved infrared spectroscopy study and look for relationships to results attained with interference lithography at pitches smaller than 22 nanometers
Type of project: Internship
Duration: three and six months are available
Required degree: Master of Science, Master of Engineering Science, Master of Engineering Technology
Required background: Chemistry/Chemical Engineering, Physics, Nanoscience & Nanotechnology
Imec allowance will be provided for students studying at a non-Belgian university.