In situ dynamics of Si etching in CMOS STI reference process

Leuven
|
About a week ago

Main goal is to check correlations between in situ measurement data coming from spectra reflectometer and ex situ inspection technique, such as xSEM or ETEM

Project can be divided into phases. First phase will be accomplished  by using POR chemistry settings.

Main goal of the phase is to check correlations between in situ measurement data coming from spectra reflectometer and  ex situ inspection technique, such as xSEM or preferable ETEM.

The former will require data extraction, smoothing of experimental points into periodical curves, subtraction of a background by using eigenvalues coming of Principle Components Analysis (PCA), definition of all extremums etc.

The latter (ex situ inspection) requires an accurate measurement of xSEM or ETEM images.

The second phase could include DOE on pulsing regimes as well as chemistries by taking 2-3 factors, where one of them will be categorical.




Type of project: Internship

Required degree: Master of Engineering Science, Master of Science

Required background: Chemistry/Chemical Engineering, Physics

Supervising scientist(s): For further information or for application, please contact: Alexey Milenin (Alexey.Milenin@imec.be)

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