PhD - Leuven | More than two weeks ago
The general aim of this PhD project is to generate fundamental insights into the nucleation and growth mechanisms during ALD of germanium chalcogenide materials. First, it is clear that we will need more complex ternary and even quaternary compounds for the stabilization of these materials and for boosting the memory cell performance. We will therefore investigate the incorporation of extra elements during ALD by using new precursor reactions. We will investigate the impact of additional precursor reactions on the growth mechanisms, to design deposition processes for complex materials with well controlled composition and stability. A second new aspect is the selectivity of germanium chalcogenide ALD processes. The concept is to grow germanium chalcogenide materials from the bottom up, only where needed in the advanced 3D structures, as this could greatly simplify the patterning process. We will therefore investigate the surface dependence of the germanium chalcogenide ALD processes, surface passivation and activation approaches, and study the growth mechanism in nanoscale structures to design selective ALD processes. The application of these understandings and the performance benefit will be tested in memory devices in close collaboration with the memory team at imec.
We will leverage imec’s 300mm state of the art R&D line and advanced characterization techniques to deliver industrially relevant research. Important to note is that this work will run in close collaboration with the world’s top-notch chemical suppliers as well as industrial tool manufacturers.
Required background: Chemistry, Nanotechnology, Material Science
Type of work: 10% literature study, 90% experimental work
Supervisor: Annelies Delabie
Daily advisor: Laura Nyns, Wouter Devulder
The reference code for this position is 2021-023. Mention this reference code on your application form.