Understanding the physical chemistry EUV photoresist using time resolved spectroscopy

Leuven - PhD
More than two weeks ago

Then a Miracle occurs: Physical chemsitry of lithography

Development of fundamental understanding of resist imaging at the molecular scale requires not only a method to form an image but to understand what happens from photon absorption to final product formation and subsequent processing. This project involves the development of processes to image features smaller than 5 nanometers in imageable polymeric materials, called resists, and, the study of the exposure of these materials using attosecond/femtosecond and slower chemistry using time-resolved spectroscopy. With this kinetic knowledge, we then want to develop and test new imaging materials for Extreme Ultraviolet lithography at 13. 5 nanometers and shorter wavelengths. Candidates should desire to be physical photo-chemists using state-of-the-art high harmonic coherent EUV sources for imaging and kinetics and us​​ing time-domain computational chemistry of excited state molecules to aid in interpretation and design of experiments.​

Required background: physical chemistry with emphasis in photochemistry

Type of work: 70% experimental/20% modeling/10% literature

Supervisor: Stefan De Gendt, John Petersen

Daily advisor: John Petersen

The reference code for this position is 1812-29. Mention this reference code on your application form.


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