/Vacuum deposited perovskite laser diodes

Vacuum deposited perovskite laser diodes

PhD - Leuven | More than two weeks ago

Gain high control over the active layer formation in future thin film laser diodes


Perovskite lasers are on the verge of showing stimulated emission not only by optical pumping but also by purely electrical excitation. Passing that milestone, this technology can provide fully wafer integrated light sources and amplifiers. While thin film processes enable high speed large area coatings, vacuum deposition increases the composition control in the vertical stack direction. In contrast to standard solution processes, vacuum technology can produce films with higher purity and enables the controlled manufacturing of heterojunctions. This allows for the fabrication of new diode architectures on the route to optimize the electronic and optical properties for the next generation of perovskite lasers. Ultimately, such thin film laser diodes can be the light sources in photonic integrated circuits, or they can be applied as large area surface emitting lasers opening new application tracks. In the proposed PhD project, we want to explore the limits of vacuum deposition as the fabrication process of a perovskite laser active medium.

Within an unprecedented short time, lead halide perovskites have been proven to be viable candidates for active materials in future optoelectronic devices. They show extraordinary performance as gain media in thin film lasers and withstand extremely high current densities under electrical pumping. At imec, we produce state-of-the-art perovskite thin film lasers and have sophisticated electro-optical characterization setups to gain a deep understanding of these systems.

It is the goal of this PhD, to combine material knowledge, chemistry and physics to form perovskite laser diodes that withstand high current density pulsing while exhibiting low lasing thresholds. Our resonator platform enables the study of the optical performance of the laser emission properties following high power excitations. This work is supported by the science and technology group of the KU Leuven.


This PhD is highly experimental and consists of two parts: thin film device fabrication and characterization. You feel comfortable in a lab environment working with vacuum processes and you are familiar with electrical and optical characterization tools. Overall, you are curious and motivated to explore the fascinating world of perovskite lasers and with their wide range of potential applications – all this in the environment of a leading research institution. Together we define the relevant target parameters to ensure an efficient development process.

At all stages of the work, you can rely on the support of our highly skilled team of engineers and scientists.

The candidate

You have recently finished your studies with a master's degree in material science, chemistry, semiconductor physics, nano-engineering, or related. You are highly motivated to dive with us into the world of thin film processing for optoelectronic devices. You are a hands-on person in a lab environment and have creativity that helps you in problem solving and data analysis. You are a team player and have good communication skills as you will work in a multidisciplinary and multicultural team. You have the chance to regularly present your results thus getting guidance and feedback from our team. Given the international character of imec and the KU Leuven, an excellent knowledge of English is a must.

Required background: material science, chemistry, physics.

Type of work: 10% literature study, 50% sample fabrication, 40% characterization and modeling.

Supervisor: Jan Genoe

Daily advisor: Robert Gehlhaar, Isabel Pintor Monroy

The reference code for this position is 2023-164. Mention this reference code on your application form.

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