June 24 - 27, 2025 | Himeji City, Hyogo, Japan
The International Conference of Photopolymer Science and Technology (ICPST) is organized by Society of Photopolymer Science and Technology (SPST) in cooperation with The Technical Association of Photopolymers, Japan, The Chemical Society of Japan, The Society of Polymer Science, Japan and The Japan Society of Applied Physics, Japan and it is focused on Photopolymer Science and Technology, Materials & Processes for Advanced Lithography, Nanotechnology and Phototechnology.
Presentation on Patterning materials in the era of High NA EUV Lithography by Danilo De Simone, Scientific Director on June 27.
The International Conference of Photopolymer Science and Technology (ICPST) is organized by Society of Photopolymer Science and Technology (SPST) in cooperation with The Technical Association of Photopolymers, Japan, The Chemical Society of Japan, The Society of Polymer Science, Japan and The Japan Society of Applied Physics, Japan and it is focused on Photopolymer Science and Technology, Materials & Processes for Advanced Lithography, Nanotechnology and Phototechnology.