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/Fraunhofer IISB Lithography Simulation Workshop 2026

Fraunhofer IISB Lithography Simulation Workshop 2026

May 28 - 30, 2026 | Behringersmühle, Germany

A workshop focussing on simulation lithography done by the modeling and AI department in Fraunhofer IISB. 

Imec will be participating in the Fraunhofer IISB Lithography Simulation Workshop 2026. 
The 21st Fraunhofer IISB lithography simulation workshop will bring together experts from various fields of lithography simulation and related areas including computational optics, photochemistry, semiconductor processing /metrology and applied artificial intelligence.
The workshop will host about 50 attendees from academics and industry. The invited talks will present reviews on recent developments and applications of computational lithography, description of novel methods to address lithography-related problems and discuss selected unresolved problems.
In addition to presentations by international experts in semiconductor lithography, the workshop provides excellent opportunities for invited PhD students to present their research work and to exchange ideas and discuss results and developments in advanced lithography.

PRESENTATION:
"Exploring frequency doubling for EUVL: solutions and limitation "
May 29
Hazem Mesilhy, R&D Engineer