July 03 - 04, 2025 | Tokyo, japan
Next generation lithography workshop for researchers and engineers from a wide range of fields related to lithography, devices, equipment, processes, and materials.
Presentation on High NA logic: Bright-field EUV mask patterning roadmap by Kenichi Miyaguchi, senior researcher, Tokyo, Japan on July 4 from 16:40-17:10
Next generation lithography workshop for researchers and engineers from a wide range of fields related to lithography, devices, equipment, processes, and materials.