June 16 - 18, 2025 | Dresden, Germany
The EMLC Conference annually brings together scientists, researchers, engineers and technicians from research institutes and companies from around the world to present their latest findings in mask and lithography techniques.
Presentation on 'Comparing bright field imaging performance at 0.33 NA of a novel low-reflectivity low-n and a standard Ta-based EUV mask', by Lieve Van Look, Researcher
The EMLC Conference annually brings together scientists, researchers, engineers and technicians from research institutes and companies from around the world to present their latest findings in mask and lithography techniques. The EMLC is dedicated to research, technology and related processes. It provides an overview of the current state of mask and lithography technologies and future strategy. Within this platform, researchers and users have the opportunity to both familiarize themselves with the latest developments and results as well as to enter into fruitful discussion with colleagues from different companies and research institutions.
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