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Photomask Japan 2026
April 08 - 10, 2026 | Yokohama, Japan
Imec will be participating in Photomask Japan 2026, the 32nd symposium on photomask and next-generation lithography mask technology. Join us to learn more on our latest breakthroughs and how to work with imec: The 32nd Symposium on Photomask and Next Generation Lithography Mask Technology
KEYNOTE
- 'High-NA EUV lithography: an evolutionary step toward next-generation single patterning'
Session 11: Opening Session Day 3 - Mask Repair
Vicky Philipsen, Lithography Engineer
INVITED SPEAKERS
- 'A holistic approach to curvilinear enablement for advanced logic scaling: from design to patterning'
Session 2 - MPC
Kenichi Miyaguchi, Researcher - 'Benefits of alternative reticles for High-NA EUV logic metal printing'
Session 12 - Metrology and Inspection
Guillaume Libeert, Researcher
PAPERS
- 'Direct Mask Modeling for Enhanced OPC Accuracy in the Era of Curvilinear Masks'
Session 1 - Mask Models
Werner Gillijns, Group Lead - 'Synthetic Mask Layout Generation for ML-Based OPC Modeling in NA0.33 EUV Lithography'
Session 1 - Mask Models
Renyang Meng, R&D Engineer - 'Curvilinear Mask Metrology: Toward Standardizing Contour-based Metrics for EUV Mask Qualification'
Session 12 - Metrology and Inspection
Balakumar Baskaran, R&D Engineer (Metrology for Lithography)