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Photomask Japan 2026
April 08 - 10, 2026 | Yokohama, Japan
The 32nd Symposium on Photomask and Next Generation Lithography Mask Technology
Imec
- 'High-NA EUV lithography: an evolutionary step toward next-generation single patterning', session 11 on Mask Repair, by Vicky Philipsen, Principal Member of Technical Staff, Imec, on April 10 at 09:00, Annex Hall 2F.
- 'Direct Mask Modeling for Enhanced OPC Accuracy in the Era of Curvilinear Masks', session 1 on 'Keynote and Mask Modeling, Computational litho', by Werner Gillijns, group lead, imec, on April 8.
- 'Random Synthetic Mask Layout for Machine Learning OPC Modeling in NA0.33 EUV Lithography', session 1 on 'Keynote and Mask Modeling', by Renyang Meng, R&D Engineer, imec, on April 8 in the morning.
About
Photomask Japan 2026 is the 32nd international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion.