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/Photomask Japan 2026

Photomask Japan 2026

April 08 - 10, 2026 | Yokohama, Japan

The 32nd Symposium on Photomask and Next Generation Lithography Mask Technology

Imec

Vicky Philipsen, Principal Member of Technical Staff, will deliver the keynote for Session 11: Mask Repair.

'Direct Mask Modeling for Enhanced OPC Accuracy in the Era of Curvilinear Masks', session 1 on 'Keynote and Mask Modeling, Computational litho', by Werner Gillijns, group lead, imec, on April 8.

About

Photomask Japan 2026 is the 32nd international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion.

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