/SPIE Advanced Lithography + Patterning

SPIE Advanced Lithography + Patterning

25 - 29 February 2024 | San Jose, California

Imec is present at SPIE Advance Lithography + Patterning 2024 with no less than 65 papers, of which 46 first-authored and 9 invited papers. With these papers, imec present the progress made in EUV processes, masks, and metrology prepared for enabling High-NA EUV lithography. Other papers present findings on sustainable practices for advanced node lithography and etch related processes.

Emily Gallagher, principal member of technical staff at imec, will also present a keynote on sustainable semiconductor manufacturing with a focus on lithography. Additionally, imec is organizing a course on advanced exploration of stochastic variations in lithography scaling and their impact on Moore’s Law.

imec highlights

Keynote - Sustainable semiconductor manufacturing with a focus on lithography, by E. Gallagher, principal member of technical staff at imec.

Invited paper - Sustainable semiconductor processing solutions: status and guidelines

Paper - Where to apply sustainability optimizations in process flows?

Invited paper - Trends in e-beam metrology and inspection

Invited paper - Material and process optimization for EUV pattern rectification by directed self-assembly

Paper - E-beam metrology and defect inspection study of thin photoresist using ASML’s eP5

Paper -  An experimental stitching study on the eve of high-NA EUV

Paper - Defect inspection methodology for contact holes

Paper - Functional underlayers, surface priming and multilayer stacks to improve dose and adhesion of EUV photoresists

All imec contributions can be found here

Event Details

Each year this important community comes together to share and discuss current research, hear the latest breakthroughs, and connect with colleagues. Be sure to browse the six conferences to see which topics will be addressed and highlighted.

Why participate in Advanced Lithography + Patterning?

  • The latest research: Learn from the hundreds of presentations from around the world that will be published in the SPIE Digital Library.
  • Connect with colleagues: Take advantage of various technical and networking events to keep you up to date with research and peers.
  • Plenary events: World-class speakers share insights on the latest challenges and opportunities from industry and academia.

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