25 - 29 February 2024 | San Jose, California
Imec is present at SPIE Advance Lithography + Patterning 2024 with no less than 65 papers, of which 46 first-authored and 9 invited papers. With these papers, imec present the progress made in EUV processes, masks, and metrology prepared for enabling High-NA EUV lithography. Other papers present findings on sustainable practices for advanced node lithography and etch related processes.
Emily Gallagher, principal member of technical staff at imec, will also present a keynote on sustainable semiconductor manufacturing with a focus on lithography. Additionally, imec is organizing a course on advanced exploration of stochastic variations in lithography scaling and their impact on Moore’s Law.
Keynote - Sustainable semiconductor manufacturing with a focus on lithography, by E. Gallagher, principal member of technical staff at imec.
Invited paper - Trends in e-beam metrology and inspection
All imec contributions can be found here
Each year this important community comes together to share and discuss current research, hear the latest breakthroughs, and connect with colleagues. Be sure to browse the six conferences to see which topics will be addressed and highlighted.
Why participate in Advanced Lithography + Patterning?