SPIE Photomask technology + EUV Lithography 2025

Imec

EUV Lithography Conference Chair
Kurt G. Ronse, imec (Belgium)

Photomask Technology Conference Co-Chair
Vicky Philipsen, imec (Belgium)

PLENARY

Wednesday All-Symposium Plenary
Session Chairs: Kurt G. Ronse, imec (Belgium) and Vicky Philipsen, imec (Belgium)

PRESENTATION

PMJ Best Paper: Bright-field EUV mask patterning for extending scaling roadmap (Invited Paper)
Kenichi Miyaguchi_¹ (presenter), Yukihiro Fujimura_², Masataka Yamaji_², Mei Ebisawa_², Izumi Hotei_², Tsukasa Abe_², Shosuke Tomizuka_², Hiroki Deguchi_², Shingo Yoshikawa_², Ling Ee Tan_¹, Darko Trivković_¹, Yasser Sherazi_¹, Ryoung-han Kim_^1
1imec (Belgium), _²Dai Nippon Printing Co., Ltd. (Japan)

EMLC Best Paper: High-NA EUV mask CD-SEM metrology matching, and contour-based comparison of simulation result and wafer print (Invited Paper)
Darko Trivkovic_¹ (presenter), Syamashree Roy_¹, Guillaume Libeert_¹, Balakumar Baskaran_¹, Vicky Philipsen_¹, Eric Hendrickx_¹, Darko Trivkovic_¹, Ulrich Welling_², Jirka Schatz_², Shosuke Tomizuka_³, Masataka Yamaji_³, Tatsuya Tomita_³, Nobuaki Fujii_³, Shingo Yoshikawa_³, Sotaro Hosoya_³, Hideki Nakaya_⁴, Toshimichi Iwai_⁴, Hideaki Komami_^4
1imec (Belgium), _²Synopsys GmbH (Germany), _³Dai Nippon Printing Co., Ltd. (Japan), _⁴Advantest Corp. (Japan)

Unraveling the role of environment on the lithographic performance of metal oxide resists: Key role of oxygen during post-exposure bake (Invited Paper)
Ivan Pollentier_¹ (presenter), Fabian Holzmeier_¹, Hyo Seon Suh_¹, Kevin Dorney_^1
1imec (Belgium)

Stitching at high-NA EUV: A first experimental study (Invited Paper)
Vincent J. I. Wiaux_¹ (presenter), Natalia Davydova_³, Tatiana Kovalevich_¹, Nick Pellens_¹, Ataklti Weldeslassie_¹, Jad Haddad_¹, Vito D. Rutigliani_¹, Marcus Newman_², Dhruv Tyagi_², Soobin Hwang_¹, Airat Galiullin_³, Jeremy Chen_³, Adam Lyons_⁴, Frank Timmermans_³, Cyrus Tabery_^4
1imec (Belgium), _²imec (Netherlands), _³ASML Netherlands B.V. (Netherlands), _⁴ASML US, Inc. (United States)

Development of CNT pellicles for mass production and next generation EUV scanners (Invited Paper)
Yosuke Ono_² (presenter), Masashi Fujimura_², Tenga Takahashi_², Takashi Kozeki_², Marina Timmermans_¹, Ivan Pollentier_^1
1imec (Belgium), _²Mitsui Chemicals, Inc. (Japan)

High-NA stitching: Model and OPC assessment for logic metal printing with a low-n mask (Invited Paper)
Qinglin Zeng_² (presenter), Dongbo Xu_³, Werner Gillijns_¹, Xuefeng Zeng_², Roel Gronheid, Sandip Halder_¹, Sujan Kumar Sarkar_¹, Fan Jiang_², Shibing Wang_², Yuyang Sun_², Germain Fenger_^2
1imec (Belgium), _²Siemens EDA (United States), _³Siemens EDA (Belgium)

Alternative EUV multilayer mirror mask for reduced mask 3D effects evaluated at NA0.33
Tatiana Kovalevich_¹ (presenter), Nick Pellens_¹, Guillaume Libeert_¹, Lieve Van Look_¹, Andreas Frommhold_¹, Vicky Philipsen_¹, Tsukasa Abe_², Yukihiro Fujimura_², Izumi Hotei_², Mei Ebisawa_², Masataka Yamaji_², Shosuke Tomizuka_², Shingo Yoshikawa_^2
1imec (Belgium), _²Dai Nippon Printing Co., Ltd. (Japan)

Tuning, modelling, and verifying effects of intermixing on EUV multilayer mirror performance via a combined simulation and experimental approach
Kevin M. Dorney_¹ (presenter), Eva Nerke_², Katrina Rook_⁴, Antonio Checco_⁴, Vitaly Krasnov_¹, Ankit Nalin Mehta_¹, Andy Dawes_³, Ulrich Klostermann_², Ulrich Welling_², Wolfgang Hoppe_², Meng Lee_⁴, Vicky Philipsen_^1
1imec (Belgium), _²Synopsys GmbH (Germany), _³Synopsys, Inc. (United States), _⁴Veeco Instruments Inc. (United States)

Lithography strategies on overlay control of backside processing in complementary field effect transistor (CFET) device (Invited Paper)
Rajendra Kumar Saroj_¹ (presenter)
_¹imec (Belgium)

Holistic dry resist optimization on bright field EUV contact hole patterning
Ching-Chung Huang_² (presenter), Francesco Gullo_², Mohand Brouri_², Anuja De Silva_³, Andrew Lushington_³, Nizan Kenane_³, Boris Volosskiy_³, Rich S. Wise_³, Mihir Gupta_¹, Hyo Seon Suh_¹, Bernardo Oyarzun Rivera_⁴, Joost van Bree_⁴, Herman Nicolai_⁴, Gijsbert Rispens_^4
1imec (Belgium), _²Lam Research Belgium BV (Belgium), _³Lam Research Corp. (United States), _⁴ASML Netherlands B.V. (Netherlands)

Depth-of-focus enhancement in high-numerical aperture EUV lithography by source and mask optimization (Invited Paper)
Guillaume Libeert_¹ (presenter), Joern-Holger Franke_¹, Sofia Leitao_², Natalia Davydova_², Vicky Philipsen_¹, Praniesh Ayyanar Ramachandran_³, Susan Sherin Kadeparambil Varghese_^3
1imec (Belgium), _²ASML Netherlands B.V. (Netherlands), _³imec (Netherlands), 

Actualizing EUV mask model through TEM/EDX analysis (Invited Paper)
Rik M. Jonckheere_¹ (presenter), Olivier Richard_¹, Vicky Philipsen_^1
1imec (Belgium)

Impact of MOR anomalies on lithography and OPC: Challenges and solutions (Invited Paper)
Pervaiz Kareem_¹ (presenter), Werner Gillijns_^1
1imec (Belgium)

Defectivity-aware EUV process window characterization for monolithic complimentary FET HAR and 3D patterning (Invited Paper)
Hong-Cheon Yang_¹ (presenter), Min-Soo Kim_¹, Xiuju Zhou_¹, Christophe Beral_¹, Kaushik Sah_², Loemba Bouckou_², Luca Barbisan_², Ganesha Srivallabha Durbha_², Roel Gronheid_^2
1imec (Belgium), _²KLA Corp. (Belgium)

Advances of dry resist towards next-generation lines-spaces patterning in high-NA EUV lithography (Invited Paper)
Ali Haider_² (presenter), Zhengtao Chen_², Shruti Jambaldinni_², Anuja De Silva_², Rich Wise_³, Matteo Beggiato_¹, Christophe Beral_¹, Hyo Seon Suh_¹, Danilo De Simone_^1
1imec (Belgium), _²Lam Research Belgium BV (Belgium), _³Lam Research Corp. (United States)

Mitigation of pattern collapse in EUV lithography using SCREEN’s novel rinse technology for metal oxide resist
Seungjoo Baek_² (presenter), Elke Caron_², Wesley Zanders_², Andreia Santos_², Masahiko Harumoto_³, Seonggil Heo_¹, Jelle Vandereyken_^1
1imec (Belgium), _²SCREEN SPE Germany GmbH (Germany), _³SCREEN Semiconductor Solutions Co., Ltd. (Japan)

Energy-efficient EUV lithography using PFAS-free, light-curable underlayers for advanced nodes
Seonggil Heo_¹ (presenter), Jelle Vandereyken_¹, Min Seong Jeong_¹, Elke Caron_², Wesley Zanders_², Seungjoo Baek_², Andreia Santos_², Douglas Guerrero_³, Masahiko Harumoto_^4
1imec (Belgium), _²SCREEN SPE Germany GmbH (Germany), _³Brewer Science, Inc. (United States), _⁴SCREEN Semiconductor Solutions Co., Ltd. (Japan)

Understanding the impact of the EUV photon absorption distribution in a patterned EUV resist and its lithographic performance
Danilo De Simone_¹ (presenter), Vicky Philipsen_¹, Alex Vaglio Pret_^2,3, Anatoly Burov_^3
1imec (Belgium), _²KLA Italy Srl (Italy), _³KLA Corp. (United States)

Enabling curvilinear masks: novel mask qualification methodology and experimental verification
Darko Trivković_¹ (presenter), Xiaolong Wang_¹, Xuelong Shi_¹, Chieh-Miao Chang_¹, Renyang Meng_¹, Jane Wang_¹, Victoria Malacara_¹, Joost Bekaert_¹, Balakumar Baskaran_^1
1imec (Belgium)

Energy-efficient optical crosslinking system and PFAS-free underlayers in ArFi lithography: key enablers for sustainable semiconductor technologies and systems
Min Seong Jeong_^1,2,3 (presenter), Seonggil Heo_¹, Jelle Vandereyken_¹, Elke Caron_⁴, Wesley Zanders_⁴, Seungjoo Baek_⁴, Andreia Santos_⁴, Douglas Guerrero_⁵, Masahiko Harumoto_^6
1imec (Belgium), _²Seoul National Univ. of Science and Technology (Korea, Republic of), _³KU Leuven (Belgium), _⁴SCREEN SPE Germany GmbH (Germany), _⁵Brewer Science, Inc. (United States), _⁶SCREEN Semiconductor Solutions Co., Ltd. (Japan)

TECHNICAL

Panel discussion: Trends in mask complexity: a curse or a blessing?
Panelist: Tatiana Kovalevich, imec (Belgium)

SOCIAL AND NETWORKING EVENT

Women in Optics Networking Lunch
Featured Speaker: Vicky Philipsen (imec)

More details on all imec contributions at SPIE Photomask Technology + EUV Lithography can be found here. 

About

This important conference addresses important topics and advancements in photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme ultraviolet lithography, and emerging technologies. Escape the day-to-day and talk with scientists and engineers to share the spontaneous ideas that only happen when we gather in person.

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