/SPIE Photomask technology EUV Lithography

SPIE Photomask technology EUV Lithography

30 September - 04 October 2024 | Monterey, US

The premier technical meeting for mask makers, EUVL, and emerging technologies


Monday, 30 September 2024

  • Unfolding the curves: novel designs and metrology methods for curvilinear masks qualification - Darko Trivkovic
  • Increasing throughput in EUV logic applications with thinner low-n masks and wavefront optimization (Invited Paper) - Nick Pellens

Tuesday, 1 October 2024

  • A study on programmed defect propagation from design to mask to wafer using SEM metrology - Balakumar Baskaran
  • Single exposure EUV patterning optimization and defect inspection of hexagonal contact hole arrays using voltage contrast metrology - Shubhankar Das

Thursday, 3 October, 2024

  • The influence of reflectivity on EUV lithography performance of low-n and binary masks for random logic via implementation - Ling Ee Tan
  • BEFORCE : a pathway to unravel metal oxide resist (MOR) reactions upon EUV exposure, bake and environment (Invited Paper) - Ivan Pollentier

Friday, 4 October, 2023

  • EUV dose reduction for pitch 28 nm line-space - Mihir Gupta

Friday, 5 October, 2023

  • Application of SONR for a better OPC model with a EUV curvilinear photomask, Sujan Sarkar et al. 

More details on all imec contributions at SPIE Photomask Technology + EUV Lithography can be found here


Make plans to join the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme ultraviolet lithography, and emerging technologies. Escape the day-to-day and talk with scientists and engineers to share the spontaneous ideas that only happen when we gather in person.

Discuss your product requirements with top suppliers at the free two-day exhibition. Meet with industry partners who can help you solve problems, cut costs, and increase your capabilities. Register now and make plans to attend.

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