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/SPIE Photomask technology + EUV Lithography 2025

SPIE Photomask technology + EUV Lithography 2025

September 21 - 25, 2025 | Monterey, US

The premier technical meeting for mask makers, EUVL, and emerging technologies

Imec

  • Dry resist process optimization at the 0.33NA resolution limit and validation via large area e-test inspection - Stephane Lariviere
  • Advancements in dry resist patterning towards high NA EUV enablement  - Matteo Beggiato
  • Enabling Curvilinear Masks: Novel Mask Qualification Methodology and Experimental Verification - Darko Trivkovic
  • Advances of dry resist towards next-generation lines-spaces patterning in high NA EUV lithography - Matteo Beggiato
  • Stitching at high NA EUV: a first experimental study - Vincent Wiaux
  • Impact of MOR Anomalies on Lithography and OPC: Challenges and Solutions - Kareem Pervaiz
  • Defectivity-Aware EUV Process Window Characterization for Monolithic Complimentary FET HAR and 3D Patterning - Yang, Hong-Cheon
  • Lithography strategies on overlay control of back-side patterning - Saroj, Rajendra Kumar
  • Unraveling the role of environment on the lithographic performance of metal oxide resists: key role of oxygen during post-exposure bake - Ivan Pollentier
  • Understanding the impact of the EUV photon absorption distribution in a patterned EUV resist and its lithographic performance - Danilo De Simone
  • TEM/EDX analysis in support of EUV mask model improvement - Rik Jonckheere
  • Bright-field EUV mask patterning for extending the scaling roadmap - Kenichi Miyaguchi

More details on all imec contributions at SPIE Photomask Technology + EUV Lithography can be found here. 

About

Make plans to join the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme ultraviolet lithography, and emerging technologies. Escape the day-to-day and talk with scientists and engineers to share the spontaneous ideas that only happen when we gather in person.

Discuss your product requirements with top suppliers at the free two-day exhibition. Meet with industry partners who can help you solve problems, cut costs, and increase your capabilities. Register now and make plans to attend.

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