Comparative Study of Deposition Conditions on the Structural and Piezoelectric Properties of AlN Thin Films
Internship/thesis - Leuven | Just now
Advancing Next-Generation Piezoelectric Materials
Aluminium nitride (AlN) thin films are a key enabling material across a wide range of technologies, including power and RF electronics, photonics, and piezoelectric MEMS and NEMS devices, owing to their CMOS compatibility, thermal stability, and high acoustic velocity. The functional performance of AlN, particularly its piezoelectric response, is strongly governed by deposition conditions. This internship project explores how different sputtering techniques influence the structural and electromechanical properties of AlN thin films. AlN layers will be grown using mid-frequency (MF) sputtering and high-power impulse magnetron sputtering (HiPIMS), enabling a systematic comparison of growth-induced effects. Structural and morphological properties will be examined, and microfabricated test structures will be used to experimentally probe the piezoelectric response. By comparing crystallinity, surface morphology, and electromechanical behavior across the two growth approaches, the project aims to uncover structure–property relationships relevant to advanced electronic and photonic device applications.
The work will be carried out in a research-driven environment at imec, where you will gain hands-on experience in thin-film growth, microfabrication, and test characterization, as well as a broader technological perspective on the development of cutting-edge technologies.
Type of Internship: Combination of internship and thesis
Master's degree: Master of Science; Master of Engineering Science; Master of Engineering Technology
Required educational background: Nanoscience & Nanotechnology; Materials Engineering; Physics; Electrotechnics/Electrical Engineering
University Promotor: Clement Merckling (KU Leuven)
For more information or application, please contact the supervising scientist Mustafa Yildirim (Mustafa.Yildirim@imec.be).