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High-speed UV Nanopatterning for Metasurfaces and Optical Device Fabrication
Master internship, PhD internship - Leuven | Just now
Explore state-of-the-art nanotechnology in optical design and nanopatterning
Description:
We focus on the development of nanopatterning processes for electronic device applications using innovative lithographic methods. Multilayer patterning based on advanced optical principles is of particular interest for achieving high-speed, large-area nanofabrication. This work aims to understand material characterization during the lithographic process and the associated light–matter interactions. Process optimization is an integral part of the topic to ensure high-quality pattern formation on samples. During the training period, hands-on experience in lithography as well as metrology for optical characterization will be acquired.
Responsibilities:
• Prepare samples and receive training in lithographic patterning processes.
• Perform optical simulations for lithography.
• Support the design and fabrication of metasurfaces.
• Document experimental results and contribute to reports and presentations.
Type of internship: Master internship, PhD internship
Required educational background: Bioscience Engineering, Materials Engineering, Mechanical Engineering, Nanoscience & Nanotechnology, Physics
Supervising scientist(s): For further information or for application, please contact Hyun-su Kim (Hyun-su.Kim@imec.be)
The reference code for this position is 2026-INT-079. Mention this reference code in your application.
Only for self-supporting students.
Applications should include the following information:
- resume
- motivation
- current study
Incomplete applications will not be considered.