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Improved quantum-device characteristics in a semi-industrial process flow

Imec shows uniform and tunable all-silicon spin qubit devices in a 300mm integrated process flow.


At VLSI 2021, imec presents its progress in the device characteristics of electron-spin qubits in terms of the uniformity and tunability needed to create qubits arrays for computing purposes. 

In parallel, an all-silicon approach is adopted to increase thermal compatibility at cryogenic temperatures.

The devices are produced in imec’s dedicated 300mm process flow, which supports future industrial compatibility.