/2.5D Hyperpixel Computational imaging and patterning with Nano-optical System Development

2.5D Hyperpixel Computational imaging and patterning with Nano-optical System Development

Master projects/internships - Leuven | Just now

Discover the forefront of holography application and metrology through the advanced patterning and computational imaging.

The demand for 2.5D nanopatterning is rapidly increasing across a wide range of applications, including holography, meta-lenses, and advanced display and sensor technologies.

This project aims to develop innovative designs for diffractive structures and to optimize the efficiency of both the fabricated samples and the associated fabrication technologies.

The approach combines conventional lithography tools with the development of an in-house patterning solution. It also focuses on realizing hyperpixel designs with sub-micron resolution and enabling large-area printing for enhanced holographic visualization. The goal is to overcome the limitations of traditional optical systems and pave the way for breakthroughs in technologies applicable to a wide range of fields.


Expected Deliverables:

  • Modeling and simulation of sample patterns

  • Fabrication of samples and/or optical system development

  • Characterization and measurement of fabricated samples

  • A successful outcome may lead to a journal publication



Type of project: Thesis, Combination of internship and thesis

Duration: 12M

Required degree: Master of Engineering Technology, Master of Engineering Science, Master of Science, Master of Bioengineering

Required background: Nanoscience & Nanotechnology

Supervising scientist(s): For further information or for application, please contact: Hyun-su Kim (Hyun-su.Kim@imec.be)

Only for self-supporting students.

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