CMOS-Compatible MEMS and Photonic Sensors for Wafer-Surface Plasma Diagnostics
PhD - Leuven | Just now
Plasma-based semiconductor processes require precise knowledge of conditions experienced at the wafer surface. This PhD will develop one miniaturized CMOS-compatible plasma sensor, selected through a preceding concept-maturation phase from MEMS/electrical and photonic candidate technologies.
You will combine physics-based modeling, sensor-device design, fabrication, characterization, calibration and representative plasma validation. You will investigate how device geometry, materials and relevant electrical or optical interference mechanisms influence measurement fidelity and operating limits. In the final phase, you will use multiple sensor instances to demonstrate a controlled spatial plasma difference.
The project creates reusable sensor technology and design rules for future instrumented-wafer diagnostics.
Key activities
- Model the coupling between the selected plasma measurand and sensor response.
- Design and characterize CMOS-compatible MEMS or photonic structures.
- Calibrate the sensor against an accepted reference diagnostic.
- Quantify its operating envelope and plasma-induced effects.
- Demonstrate limited multi-location spatial sensing.
Required background: Electrical engineering, microelectronics, applied physics, photonics, semiconductor technology, with strong capability in semiconductor devices, sensor physics, MEMS/photonics or instrumentation
Type of work: Literature (10%) Physics-based modeling (40%), CMOS-compatible MEMS/photonic sensor design (30%) and plasma-validation experiments (20%)
Supervisor: Xavier Rottenberg (KU Leuven)
Daily advisor: Abdulkadir Yurt
The reference code for this position is 2027-092. Mention this reference code in your application.