Fast and Large Scale Micro-/Nano-lithography for Optical Devices

Background

Optical Devices such as diffractive optical elements and nanophotonic devices require precise fabrication of subwavelength structures with high spatial resolution and patterning efficiency. High-speed optical nano-patterning offers a promising approach for rapidly fabricating complex structures while maintaining precise control over the generated patterns.

This project aims to investigate and develop a high-speed optical nano-patterning approach for the fabrication of advanced optical devices. The project will combine various idea on lithographic system with combination of material characterization metrology and computational methods.

Goal

Development of a high-speed nano-patterning approach for metasurface and optical device fabrication.

Objectives

• Develop and configure an optical nano-patterning system.
• Investigate high-speed pattern generation and exposure methods.
• Design and generate nanoscale patterns for metasurfaces and optical devices.
• Characterize the fabricated structures using optical and imaging techniques.
• Investigate the relationship between patterning parameters and device performance.
• Explore computational and machine-learning approaches for pattern optimization.

Responsibilities may include (to be confirmed):

• Nano-pattern generation and computational design
• Experimental fabrication and process optimization
• Preparation of documentation and support for presentations and publications

Expected Outcomes

The internship is expected to demonstrate a high-speed nano-patterning workflow and evaluate its potential for metasurface and optical device fabrication. The project will provide practical experience in optical system development, nanofabrication, computational pattern generation, and experimental characterization.