Non-aqueous electrodeposition chemistry for superconducting and advanced materials

Many technologically important metals cannot be electrodeposited reliably from aqueous electrolytes because water reduction, oxide formation and unsuitable ion chemistry dominate the interface. This PhD will establish non-aqueous deposition routes for Al, Nb and Ta and determine how solvents, supporting electrolytes, precursor speciation, additives and process conditions control nucleation, growth, impurities, crystallography and interface quality. A leading use case is the deposition of superconducting materials for quantum computing, with particular attention to eliminating detrimental oxide interphases. The work will use planar, patterned and selected three-dimensional test structures, with nanomeshes retained as one possible demanding geometry rather than the central application. Building on newly established glovebox-plating and Schlenk-line infrastructure and an initial successful Ta deposition, the project will create transferable chemistry-process-structure-property design rules and strengthen imec’s non-aqueous capability.