Optimizing dummy dispense and process consumption of chemicals

In the lithography process multiple chemicals are used. Optimizing the process and idle consumption of these do have a direct effect on the environmental impact and cost.
You have resist and developer on the one hand, these two are needed for the photosensitive process. For the resist the idle consumption is the highest, and the area to look for improvements.
On the other hand you have solvents, used to keep the system and wafer backside clean, the volume used of these is enormous, both while idle or during processing. Changes here do have an impact on defectivity, something to keep an eye on when tuning the process.

Purpose of this internship is to reduce the consumption of the solvent, seeking for the sweet spot between defectivity and material usage.  
 
Bachelor's program/required background: Chemical or physics 

Language requirements: Dutch; English

Type of Project: Internship

Manager: Tom Vandeweyer

Mentor: Hendrik Serre

For more information or application, please contact the supervising scientists Tom Vandeweyer (tom.vandeweyer@imec.be) and Hendrik Serre (hendrik.serre@imec.be).