/Post-Doc Position: Exploration of Lithographic Solutions to Enable Sidewall Patterning for 3D Memory

Post-Doc Position: Exploration of Lithographic Solutions to Enable Sidewall Patterning for 3D Memory

Research & development - Leuven | Just now

Enable next generation memory/logic device manufacturing by developing alternative nanofabrication approaches to incorporate nanopatterns on vertical surfaces.

Post-Doc Position: Exploration of Lithographic Solutions to Enable Sidewall Patterning for 3D Memory and Logic Applications 

General description 

Data generation and storage requirement worldwide is growing at a staggering rate. To address these requirements, memory devices are transitioning from a 2D planar design to a 3D architecture, where memory cells are stacked vertically to achieve densification. Logic IC devices such as FINFET and CFET have in fact, been the frontrunner in this regard, with successful commercialized products.   

Manufacturing of these devices through nanofabrication though presents a challenge owing to aggressively shrinking length-scales and placement of repeating structures on arbitrary geometries. So far, these complex structures were fabricated through a combination of cutting-edge photolithography and innovative etch chemistries.  

However, with transistor components stacked vertically, a major difficulty arises in photolithography of repeating structures on the sidewalls (vertical surface) of preexisting features. That is because existing lithography technique enables nanofabrication of arbitrary geometries on a 2D surface. However, the same approach is not amenable to printing orthogonally, i.e., on the sidewalls of existing patterned structures. This calls for development of alternative nanofabrication strategies.  

To complement the above discussed limitations of conventional photolithography, self-assembly of block copolymers has emerged as a promising nanolithography approach. Directed self-assembly (DSA) of block copolymers (BCPs) for instance, could generate laterally ordered, periodic arrays of lines and honey-comb holes with typical sizes ranging between 3–50 nm. However, BCP self-assembly so far has been demonstrated on planar 2D surfaces. Another similar strategy is anodization of aluminium that renders the resulting anodic aluminium oxide surface porous with controllable pore diameter with arbitrarily greater depths. Some alternative photon- or lithography-based approaches have also been investigated with novel polymerizable precursors. However, none of these strategies have been applied onto 3D topographies.  

What you will do

In this project, you will primarily investigate DSA of BCPs on prepatterned 3D topographies. To enable DSA, you will utilize imec’s world-leading EUV and photolithography tools and state-of-the-art cleanroom nanofabrication and characterization facilities. You will explore both chemo and graphoepitaxy strategies in the DSA toolkit to realize the desired patterns. In parallel, you will also explore alternative nanofabrication approaches to create repeating nanoscale structures on vertical surfaces. This research could catalyse the manufacturing of next generation IC and memory devices scaled along the 3rd dimension.   

Your technical responsibilities in this role will specifically involve the following: 

  • Design experiments for rational selection of block copolymers that form co-domains comprising alternating lines or hole patterns and could establish long range order and pattern fidelity over 300 mm standard wafers.  
  • Design and develop experiments to nanofabricate on wafers, 3D patterned topographies of interest to different device architectures.  
  • Perform simulations to predict registration and orientation of DSA patterns on vertical surfaces. 
  • Design and develop strategies to incorporate chemo- and graphoepitaxy pathways on 3D patterned topographies.  
  • Validate with experiments involving DSA on 3D patterned topographies through thermal and solvent annealing pathways. 
  • Explore alternative nanofabrication and anodization strategies as well to achieve sidewall patterning. 
  • Coordinate and perform correlative experiments with imec’s lithographic materials characterization team and other teams to gather data to support your observations.  
  • Coordinate with device integration teams to benchmark relevant device operations fabricated using the innovative sidewall nanopatterning approaches.  

In addition to these technical responsibilities, you will also have the opportunity to develop personal and professional skills that will propel you to a leading position in industry or academia by, 

  • Being engaged with imec memory and logic program leaders for implementation of new techniques on device level. 
  • Presenting your findings at conferences, internal meetings, and gain exposure to key players in the global semiconductor community. 
  • Expanding your intellectual horizon by gaining exposure to nearly all aspects related to lithography and semiconductor material processing. 

What we do for you

We offer you the opportunity to join one of the world’s premier research centers in nanotechnology at its headquarters in Leuven, Belgium. With your talent, passion and expertise, you’ll become part of a team that makes the impossible possible. Together, we shape the technology that will determine the society of tomorrow.

We are committed to being an inclusive employer and proud of our open, multicultural, and informal working environment with ample possibilities to take initiative and show responsibility. We commit to supporting and guiding you in this process; not only with words but also with tangible actions. Through imec.academy, 'our corporate university', we actively invest in your development to further your technical and personal growth. 

We are aware that your valuable contribution makes imec a top player in its field. Your energy and commitment are therefore appreciated by means of a market appropriate salary with many fringe benefits. 

  • Imec values a cooperative spirit. What does it mean for you? You can easily collaborate across teams and fields with our 6000+ colleagues. Thus, directly learn from the many leading experts in nanotechnology, metrology, system architecture, etc. and accelerate your research.  
  • Extensive support infrastructure (automated measurement department, leading edge metrology department, public funding department, etc.) that will allow you to concentrate on your research.  
  • Competitive imec payroll contract as a post-doc for a fixed term of two years.  
  • Long term perspective in science! We grow our scientific high potentials in scientific leadership. Imec has a structural scientific career path, along which you can pursue a professional career as a researcher. Our young researchers also have easy access to open positions in one of the many companies of the semiconductor industry that work with imec or can transfer to an academic position at a university.  
  • We support our most promising young researchers in applying for an ERC starting grant to build up their own research group within imec that aligns with imec's vision. Furthermore, imec provides internal funding mechanisms to start new research.
  • Imec strongly supports start-up initiatives.  
  • Imec is the crossroads where all semiconductor players meet to tackle fundamental research questions and technology bottlenecks. This allows you to build a unique network within academia and industry that you will be able to leverage for any future career.  
  • Belgium and imec value family and support young researchers extensively (childcare for the youngest, flexible working hours understanding that family affairs are of high importance).  
  • Through imec.academy, 'our corporate university', we actively invest in your development to further your technical and personal growth.  
  • We are proud of our open, multicultural, and informal working environment with ample possibilities to take initiative and show responsibility. We commit to supporting and guiding you in this process, not only with words but also with tangible actions.  

Who you are

  • You have a PhD in chemistry, physics, material science, or chemical engineering ideally focussing on self-assembly, block copolymers (e.g., PS-b-PMMA, PS-b-PDMS), polymer chemistry or soft-matter.  
  • Experience in photolithography is an asset.  
  • You possess strong knowledge and/or hands-on experience in characterization techniques such as SEM, AFM, profilometer and contact angle analysis. 
  • You have a passion for research and have demonstrated excellence and independence during your PhD or post-PhD industry related experience.  
  • You take initiatives and can work on your own, while also working well as part of a team comprised of diverse technical and cultural backgrounds.  
  • You are an innovative, out-of-the-box thinker, result-driven, and can meet deadlines with quality output.  
  • You are a clear and effective communicator. Strong language skills in English are required for imec’s diverse working environment.  

IMEC and its affiliates will not accept unsolicited resumes from any source other than directly from a candidate. IMEC will consider unsolicited referrals and/or resumes submitted by vendors such as search firms, staffing agencies, professional recruiters, fee-based referral services and recruiting agencies (hereafter “Agency”) to have been referred by the Agency free of charge. IMEC will not pay a fee to any Agency that does not have a prior written agreement with IMEC, validated by its HR department, in place regarding a specific job opening and allowing to submit resumes.

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