Interview Steven Scheer
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Challenges and innovations in patterning

An imec view


In this interview, Steven Scheer, senior vice president of Advanced Patterning, Process and Materials at imec, highlights challenges and innovations that will mark the field of patterning in the short and longer term.

He explains how these are driven by the advent of High NA extreme ultraviolet lithography (EUVL), the rise of new memory and logic device concepts, and the need to reduce the environmental impact of IC manufacturing.