Realize high-resolution patterning with attractive cost of ownership with imec’s nanoimprint lithography (NIL) offering – uniquely embedded in our advanced lithography fab ecosystem.
Nanoimprint lithography enables the replication of sub-micrometric features at wafer level and on any substrates. It’s been around for quite some time. And yet, we’ve barely scratched the surface of its many possibilities. The process is used for production purposes, but mostly in a semi-automated fashion and mainly not in a semiconductor fabrication process flow.
To unleash the full potential of nanoimprint lithography, it’s time to mature the technology towards an automated, reliable foundry process that allows its integration in semiconductor manufacturing.
This maturation of nanoimprint lithography is imec’s goal. By leveraging its process capabilities for all the steps before and after imprinting, such as optical design, master manufacturing, etching and metrology, imec offers its industrial partners access to process development and low-volume manufacturing of NIL-printed devices for applications such as augmented reality and genomics.
At the heart of imec’s NIL offering is its fully automated 200- and 300mm platform with integrated modules for manufacturing working stamps, wafer cleaning and etching, imprinting, and post-imprint thermal curing.
But it takes more than one tool to achieve a successful NIL process. That’s why we offer support for all the steps of the workflow:
Technology-aware master manufacturing
By integrating nanoimprint lithography in a semiconductor manufacturing environment, we can support the development of production processes for a wide range of disruptive applications.
A lot of applications can benefit from the integration of nanoimprint lithography in their production process. A few examples:
Are you interested in working with us on these or other applications? We’re ready to support you through all the development phases: from feasibility study and design up to prototyping and low-volume manufacturing.