Internship/thesis - Leuven | More than two weeks ago
Assess the cleaning potential and etching selectivity of commonly used chemical solutions of future electronic devices!
Wet clean and surface functionalization processes are ubiquitous in the semiconductor industry. Wet processes (clean, etch, strip, etc.) are extensively used for device manufacturing integrated into modern automobiles, smart devices for communication, etc. Such complex wet cleaning and drying processes involve the removal of particles and chemical impurities from semiconductor, dielectric, and metal surfaces, using state-of-the-art wet processing hardware.
Semiconductor and dielectric materials are being widely used in electronic devices such as smartphones. Imec research materials that will be used in future device architectures. During the fabrication of devices, the materials can be exposed to various wet (cleaning or etching) chemistries; not all of them are selective to the material exposed. In this work, the cleaning potential and etching selectivity of commonly used chemical solutions will be assessed.
This industrial internship will mainly focus on experimental work, to be carried out in IMEC’s state-of-the-art cleanroom facilities and labs. The student will receive training on all tools required to perform his/her research and get hands-on experience of wet-chemical cleaning and etching techniques, basic characterization techniques (ellipsometry, FTIR, contact angle) and more advanced analytical techniques like ICPMS.
Therefore, we are looking for a motivated bachelor's student to join our team.
Language requirements: English
Type of Project: Combination of internship and thesis
Mentor: Antoine Pacco (imec)
Bachelor's program/required background: Inorganic Chemistry
For more information or application, please contract Efrain Altamirano Sanchez (email@example.com)