Development of Soft X-Ray and Extreme-UV Microscopy and Optics

This project focuses on the development of soft X-ray and extreme ultraviolet (EUV) microscopy and optical systems for high-resolution imaging and advanced metrology applications. Our research team aims to design, optimize, and implement optical configurations capable of probing nanoscale structures and material properties beyond the limits of conventional microscopy.

The work involves the development and integration of EUV/soft X-ray optical components, such as zone plates, reflective optics, and coherent illumination systems, combined with advanced imaging techniques including coherent diffractive imaging and computational microscopy. Emphasis is placed on improving spatial resolution, contrast mechanisms, and system stability for quantitative phase and structural analysis.

Depending on the applicant’s background, the project may include optical design and alignment, simulation of wave propagation, experimental system construction, data acquisition, and image reconstruction using physics-based and learning-assisted algorithms. The developed microscopy platform is expected to contribute to applications in semiconductor metrology, nanofabrication process monitoring, and advanced materials characterization.