Soft X-Ray Radiation for computional nanometrology

In optical metrology, conventional microscopes face increasing challenges in achieving nanometer-scale resolution, as industrial demands continue to push for patterns with ever-smaller critical dimensions. There is also a growing need for non-destructive, sub-100 nm resolution metrology techniques suitable for wide-field imaging, particularly given the increasing structural complexity and the use of new materials in semiconductor and biomedical applications.

This project explores soft X-ray radiation and its application in imaging systems for next-generation metrology, extending beyond conventional laser, ultraviolet, and hard X-ray technologies. The research focuses on plasma-based soft X-ray sources to develop cost-effective and versatile solutions. It also emphasizes the efficient design of both the radiation source and optical components, aiming to expand the range of applications in semiconductor inspection and healthcare imaging.

Responsibilities:

• Simulation of optical systems (ray tracing)

• Design and/or fabrication of diffractive or refractive optics

• Research and simulation of hot dense plasma (quantum photonics approach)

• Optical system characterization

• Successful results may lead to a peer-reviewed journal publication