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Soft X-ray/EUV plasma simulation for microscopic metrology
Master internship - Brussel | Just now
Explore and advance state-of-the-art optical technologies for semiconductor and biomedical applications
This project aims to explore nonlinear optical phenomena occurring in hot, dense plasmas generated from gas targets using both laser-induced and discharge-produced methods. The research will contribute to fundamental understanding and advancement of plasma-light interaction in extreme conditions, relevant for application of high-resolution microscopy useful for metology, and plasma-based light sources generation. The project will combine literature reviews and simulation work, with a focus on optimizing plasma generation and emission characteristics from gas targets.
Type of internship: Master internship
Required educational background: Nanoscience & Nanotechnology, Physics
Supervising scientist(s): For further information or for application, please contact Hyun-su Kim (Hyun-su.Kim@imec.be)
The reference code for this position is 2026-INT-100. Mention this reference code in your application.
Applications should include the following information:
- resume
- motivation
- current study
Incomplete applications will not be considered.