Chemistry and Confinement‑Driven Interactions of Sub‑10 nm Particles at Interfaces

As characteristic device dimensions in advanced semiconductor manufacturing continue to scale, sub‑10 nm particles are expected to play an increasingly important role in final device performance. However, it remains unclear to what extent such particles can be described using classical contamination concepts, or whether their formation and interactions require a new physical‑chemistry framework. This PhD aims to establish a fundamental understanding of the chemical nature, interfacial forces, and confinement effects governing sub‑10 nm particle interactions with surfaces and within nano‑confined environments. In parallel, the project seeks to identify the chemical and molecular precursors from which these particles emerge through correlations between particle composition, interfacial state, and formation pathways. By combining surface‑sensitive characterization techniques, force measurements, and modelling of confined systems, the research investigates adhesion, mobility, and detachment mechanisms, including non‑classical contributions arising from deformation and entanglement. The resulting insights provide a scientific basis for defectivity control at the sub‑10 nm scale and underpin next‑generation nanoscale manufacturing, supporting the resilience and long‑term competitiveness of advanced industrial technologies.