/Short Wave Infra-Red (SWIR) Thin Film Imagers Using Next Generation Materials

Short Wave Infra-Red (SWIR) Thin Film Imagers Using Next Generation Materials

Leuven | More than two weeks ago

Pioneering new materials for Eco-Friendly SWIR Sensing

Imec is a world leader in the development of novel SWIR imager sensor technology. Emerging technologies investigate the ability to sense and detect light in the SWIR. Autonomous cars, smart agriculture, eye tracking for AR and VR applications, face recognition, surveillance, machine vision and new microscopy techniques can take advantage of additional information found in SWIR. Thin-film photodetectors show potential for cost-effective, high-res SWIR sensing. However, imec is currently using restricted elements, such as Pb, for realizing this technology, which hinders adoption by the industry. Exploring heavy metal-free materials, such as quantum dots and organic materials for SWIR sensors is crucial to overcome these limitations and create efficient, tunable, and environmentally friendly SWIR image sensors. 

The purpose of this PhD is to research thin-film SWIR photodetectors based on heavy metal free materials, combining quantum dots, organic and polymeric materials. 

The full device stack will be defined by the optical and electrical properties of each layer, as well as the process limitations inherent to stacking thin films. In depth characterization will be crucial to understand the energetic landscape of the stack and to demonstrate high performance operation with high signal to noise ratio (SNR). A close collaboration with material providers is required for feedback on the inherent characteristics and limitations of the materials. This PhD, therefore, has two important pillars: 1) opto-electrical characterization of organic, polymer and quantum dot-based photodiodes, and 2) process development to realize complex stacks with novel materials for the high performance of photo-detection. The PhD student will be involved in the entire fabrication cycle (design, processing, characterization, and patterning) performed in the state-of-the-art facilities including imec's cleanroom and dedicated thin-film labs. 

The candidate is a highly motivated recent graduate holding a master’s degree in nano-engineering, physics, chemistry, material science, electrical engineering, or related. You have an interest in the processing of thin-film semiconductors, optical effects in such layers, and electrical and optical characterization. You will be expected to work safely in a cleanroom environment and acquire processing and lab skills. It is expected that you will present results regularly.  You are a team player and have good communication skills as you will work in a multidisciplinary and multicultural team spanning several imec departments. Given the international character of imec, an excellent knowledge of English is a must. 

Required background: nano-engineering, chemistry, physics, materials science or electrical engineering with strong affinity for device physics

Type of work: 10% literature study, 10% modeling, 10% design, 50% processing, 20% characterization

Supervisor: Jan Genoe

Daily advisor: Wenya Song, Itai Lieberman

The reference code for this position is 2024-142. Mention this reference code on your application form.

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