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Imec Presents Complementary FET as Scaling Contender for Nodes Beyond N3

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Lithium-metal battery achieves 1070 Wh/L through cost-effective manufacturing process

Point-of-care cell therapy

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Point-of-care manufacturing of cell therapies

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Progress in proteomics

Meet imec fellow Jan Craninckx

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Meet imec fellow Jan Craninckx

PR High-NA first exposure

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Imec demonstrates logic and DRAM structures using High NA EUV Lithography

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Next-generation sensor for multi- and hyperspectral imaging

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Si spin qubits manufactured with state-of-the-art 300mm integration flows.

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Chiplets: piecing together the next generation of chips (part I)

Article High-NA EUVL

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Entering the High NA EUV Lithography era

Published on:

20 June 2018

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