PhD - Leuven | Just now
Previous studies on TM in metal interconnects have primarily focused on sub-micron Cu lines, using on-chip heaters to impose thermal gradients. Lifetime models have been developed and validated for such Cu-based structures. However, these models still need to be confirmed for alternative metallization schemes such as Co and Ru, as well as across scaled line dimensions. The scaling behavior of the underlying physical mechanisms remains unclear, yet it is critical for advanced technology design. Moreover, the broader impact of thermal gradients from individual metal lines to the full-chip architecture remains largely unexplored, and transferring reliability insights into advanced interconnect platforms remains necessary.
The goal of this PhD project is to investigate the reliability of advanced interconnects under thermal gradients. The research aims to achieve the following outcomes:
The proposed research activities include:
Required background: Master’s degree in Electrical Engineering, Materials Science, Physics, or a related field.
Type of work: Literature (10%). Modeling (30%), Test structure design (10%), Experimental (50%)
Supervisor: Kristof Croes
Daily advisor: Youqi Ding, Olalla Varela Pedreira
The reference code for this position is 2026-173. Mention this reference code on your application form.