Imec’s Advanced RF program explores the next generation of wireless networking. Our approach combines the benefits of silicon CMOS and III-V technologies, based on concrete system needs.
Connectivity is more crucial than ever. As 5G rolls out, the industry already looks ahead to meet demands for faster data rates, lower energy consumption, and reduced latency.
By expanding the frequency spectrum above 6 GHz, larger bandwidths become available. The FR3 (Frequency Range 3) spectrum, ranging from 7-24 GHz, is gaining interest for its potential to balance capacity and coverage effectively.
Looking further, 6G will move to even higher frequencies: mmWave bands well above 100 GHz. This will enable new use cases that thrive on networks of diverse devices and new modes of human-machine interaction, such as:
These higher frequencies bring quite some challenges. The most important one being that silicon CMOS can no longer efficiently deliver the necessary performance, especially in critical front-end module (FEM) components like power amplifiers.
The solution comes from III-V semiconductors such as gallium nitride (GaN) and indium phosphide (InP). Their material properties enable them to outperform silicon CMOS, providing the required output power and efficiency at high operating frequencies.
Zoom-in of a 300 mm silicon wafer showing dies with InP NRE HBT structures.
Imec’s Advanced RF program paves the way for high-performance, energy-efficient, scalable, and low-cost radio solutions by integrating GaN and InP into established CMOS processes. Our R&D spans two levels:
Unlike GaN-on-SiC, currently used for some high-frequency RF applications, GaN-on-Si is suitable for mass production on 200- or 300mm wafers. Imec leverages its experience with Gan-on-Si for power devices and optimizes this platform for RF use.
Longread: DC Reliability of high-κ GaN-on-Si MOS-HEMTs for mmWave power amplifiers
Example of CMOS-compatible GaN-on-Si technology with 3-level Cu BEOL.
Some features of imec’s RF Gan-on-Si technology:
Our offering includes:
For frequencies around and above 100 GHz, InP offers the best power-efficiency trade-off. However, its potential is limited as long as its fabrication depends on lab processes on small wafers.
Imec aims to make InP manufacturing processes CMOS-compatible. Three approaches are considered for integrating InP on silicon:
Once the manufacturing of III-V devices is scaled up, further cost reduction is possible by limiting the use of these costly devices to areas where their performance is essential. Other parts of the system can then still be developed in silicon CMOS.
This chiplet approach stems from imec’s expertise in 3D integration. Technologies like scaled micro-bumps, high-aspect-ratio through-silicon vias (TSVs) and multi-layer Cu damascene routing enable heterogeneous integration through Si interposer technology, offering a smaller footprint and lower loss compared to advanced PCB technology.
InP power amplifier chiplet mounted on RF silicon interposer with 0.1 dB insertion loss at 140 GHz.
Some features of imec’s RF interposer technology:
Our offering includes:
A 4-stage PA and LNA with integrated switch. Designed in 22nm CMOS with 12.5 dBm output power at 140 GHZ (reference).
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Do you (almost) have a master’s degree in electrical engineering, computer science, or another related field? Are you excited about the recent evolutions in beyond 5G? And do you want to help change the world by making communication ubiquitous, sustainable intelligent and/or invisible? Then you should consider applying for a PhD or postdoc position at imec.